氧化镍电致变色薄膜及其器件的制备与性能研究
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1.兰州交通大学材料科学与工程学院,兰州 730070;2.纳能镀膜丹阳有限公司,丹阳 212300;3.北京航空航天大学能源与动力工程学院,北京 100191

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TM24

基金项目:

国家自然科学基金(51862022, 61875005)


Preparation and Properties of Electrochromic Films and Devices Based on Nickel Oxide
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Affiliation:

1.School of Materials Science and Engineering, Lanzhou Jiaotong University,Lanzhou 730070;2.Danyang Nano Coating Co., Ltd.,Danyang 212300;3.School of Energy and Power Engineering, Beihang University,Beijing 100191

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    摘要:

    以氧化铟锡(ITO)玻璃为基底,采用直流反应磁控溅射法在室温环境下制备了高透过率调制的NiOx薄膜,利用X射线衍射仪(XRD)、扫描电子电镜 (SEM)、紫外可见分光光度计(UV 3600)对薄膜进行分析和表征,研究溅射过程中氩氧比、气压、功率对薄膜结构、形貌及电致变色性能的影响。结果表明:制备的NiOx薄膜表面有明显的结晶颗粒及孔隙,并沿(200)晶面择优生长;随着气压、功率、氧分压的增大,透过率调制先增大后减小,在时间为45 min、溅射气压4.9 Pa、氩氧比113∶7、功率215 W时最高可达58.3%,着褪色响应时间分别为9和19 s,相应的着褪色效率分别为77.56和40.39 cm2/C;以最优工艺的NiOx薄膜组装了结构为Glass/ITO/NiOx/Li-electrolyte/WO3/ITO/Glass的电致变色器件,器件在550 nm处的光调制幅度为46.5%,着褪色时间分别为27和45 s,相应的着褪色速率为1.5和0.9 %/s,在循环500次后透过率调制保持在40%以上。

    Abstract:

    In this paper, high transmittance modulated NiOx thin films were prepared by DC reactive magnetron sputtering method at room temperature by using indium tin oxide (ITO) glass as the substrate. The film was analyzed and characterized by X-ray diffractometer (XRD), scanning electron microscope (SEM),UV-Vis spectrophotometer (UV 3600), the effects of argon-to-oxygen ratio, air pressure and power on the electrochromic properties of the film during sputtering was studied. The results show that the prepared NiOx film has obvious crystal grains and pores on the surface, and preferentially grows on the(200)crystal plane.With the increase of air pressure, power and oxygen partial pressure, the transmittance modulation first increases and then declines.When the time is 45 min, the sputtering pressure is 4.9 Pa, the argon-oxygen ratio is 113∶7,and the power is 215 W, the maximum can reach 58.3%. The coloring and fading response times are 9 s and 19 s,respectively, and the corresponding coloring and fading efficiency are 77.56 cm2/C and 40.39 cm2/C; the electrochromic devices with the structure of Glass/ITO/NiOx/Li-electrolyte/WO3/ITO/Glass are prepared with the optimal NiOx film, and the light modulation amplitude of the device at 550 nm is 46.5%, the dyeing and fading times are 27 s and 45 s, the corresponding dyeing and fading rates are 1.5 %/s and 0.9 %/s, and the transmittance modulation remained above 40% after 500 cycles.

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罗自良,王顺花,毛佳伟,朱鸣飞,刁训刚.氧化镍电致变色薄膜及其器件的制备与性能研究[J].宇航材料工艺,2022,52(5):66-73.

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  • 收稿日期:2022-04-21
  • 最后修改日期:2022-10-10
  • 录用日期:2022-06-23
  • 在线发布日期: 2022-10-20
  • 出版日期:
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